Vanguard Epitaxial Wafer Ultrasonic Cleaning Machine

Epitaxial Wafer Ultrasonic CleanerVGT-1509FH

Composition of Epitaxial Wafer:

An epitaxial wafer refers to a semiconductor thin film grown on a substrate, primarily composed of three parts: P-type, quantum well, and N-type.

Does the Epitaxial Wafer Need Cleaning?

The epitaxial wafer needs to be cleaned before measuring resistance. Common cleaning process steps include: cleaning, spin drying, and then measurement.

Epitaxial wafers belong to the semiconductor industry. During the preparation of semiconductor materials, every step involves cleaning, and the quality of cleaning directly affects the next process and even the yield of the device.

VGT-1509FH Ultrasonic Cleaner:

The cleaner used for epitaxial wafer cleaning is equipped with an overflow tank and a drying tank. Weigute's VGT-1509FHUltrasonic Cleaner has a total of 15 functional tanks, configured with a circulation filtration system, soaking system, automatic constant temperature system, overflow system, agitation system, ultrasonic cleaning system, slow pull dehydration system, hot air drying system, etc. The cleaning part and the slow pull hot air drying part are independently controlled by electrical systems. The equipment uses environmentally friendly organic solvent washing, aqueous solvent cleaning, pure water rinsing, slow pull dehydration, and hot air drying, making it an environmentally friendly cleaner.

Ultrasonic cleaning is based on cavitation, where countless bubbles rapidly form and implode in the cleaning solution. These bubbles are generated by applying high-frequency (ultrasonic frequency), high-intensity sound waves to the liquid. Therefore, any ultrasonic cleaning system must have three basic components: a tank to hold the cleaning solution, a transducer that converts electrical energy into mechanical energy, and an ultrasonic generator that produces high-frequency electrical signals.

The cleaning capacity of the equipment is 3-8 minutes (adjustable) per basket.

VGT-1509FH Ultrasonic Cleaner Configuration:

Ultrasonic Aqueous Cleaning Tank:

1、Each tank is equipped with four-sided overflow ports, with an overflow tank width of 35mm. Each tank is an independent circulation tank, where the cleaning agent is pumped from the storage tank by a circulation pump, filtered, and then returned to the cleaning tank, achieving sub-tank circulation.

2、Equipped with an independent circulation filtration system.

3、Configured with a fourth-generation ultrasonic generator, fundamentally ensuring effective conversion efficiency of ultrasonic waves, guaranteeing ultrasonic performance, and ensuring the stability of the ultrasonic generator.

4、The ultrasonic generator is equipped with a microcontroller and a unique timing system, allowing flexible adjustment of cleaning time according to production needs and enabling one-to-one settings, ensuring consistency in cleaning.

5、The storage tank is divided into two chambers by a partition. The cleaned solution after oil separation is pumped back into the cleaning tank by the circulation pump, achieving self-circulation and improving solution utilization. The separated oil is discharged into the main drain pipe.

Ultrasonic Recycled Pure Water Rinsing Tank:

1、Equipped with an independent tank.

2、A drain valve is installed at the bottom of the tank.

3、Agitation is set outside the tank.

4、Equipped with a heating system.

Slow Pull Dehydration Tank:

1、The tank body has a serrated overflow structure, and pure water enters from the pure water preheating tank. The outside of the tank is lined with 10mm thick insulation cotton.

2、The tank is equipped with an "OMRON" digital temperature control system to monitor the working temperature inside the tank, with a temperature control range from room temperature to 120°C.

3、Small exhaust holes are installed at the top of the tank to remove overflowing water vapor, preventing it from re-adhering to the products.

4、An FFU system is added at the top of the drying tank to effectively reduce the impact of the environment on cleaning effectiveness. (After the workpiece is heated, its adhesion to dust increases. The FFU creates negative pressure, effectively reducing environmental impact on cleaning effectiveness, thereby fundamentally improving product yield.)